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MPS is Chapman Instruments’ next generation of noncontact surface profiler with primary focus on matching future requirements of the wafer manufacturing industry the system was redesigned for more effecient wafer surface measurements and analysis. |
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 FETURES |
- Non-contact measurements at any location
- 2 million data points in a single linear scan
- 360 degrees circular measurements on any
- Capability for polished and/or roughed wafers
- Automated objective changer
- Integrated air cushion
- Unique automated edge measurements |
| SPECIFICATION |
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Specification & Description |
| DOWNLOAD |
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Specification
& Description |
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