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Chapman：MP-2100 |
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Chapman Instruments was founded in 1989 with a simple mission - to design, market and support the world's finest optical, non-contact instruments for topography measurements of critical surfaces (i.e. computer disk media, semiconductor wafers, optical lenses etc.) Instantly embraced by the computer disk industry where specific surface features are required, Chapman has become a leader in computer disk surface profiling.
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 FETURES |
- Non-contact scanning
- 0.01 nm height resolution
- 50 nm data sampling
- 0.50 µm lateral resolution
- Fast, complete circular scans (360o around wafer surface)
- Nomarski Viewing System for high definition visual inspection
- Scan lengths ranging from µm to complete circumferences(200 or 300 mm wafer)
- Roughness and waviness data from a single scan
- Non-contact 3D scans
- Automated sample positioning (X, Y, theta)
- Customized measurement sequences with multiple scans implemented with a single keystroke
- utomated focus acquisition
- Closed loop auto-focus system allows focus to be maintained while scanning over samples with varying topography
- Optional robotic handling |
| SPECIFICATION |
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Specification & Description |
Vertical resolution |
0.01 nm |
Horizontal resolution |
0.5 µm |
Linear scan length |
Up to 100 mm |
Circular scan Length |
Complete circumference of wafer |
X and Y stage resolution |
1 µm |
Theta stage resolution |
0.001 degree |
Fine data sampling |
50 nm (minimum) |
| DOWNLOAD |
Item |
Specification
& Description |
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Brochure |
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